PHI ADEPT 2 面向半导体工艺验证、产线补线与设备流通场景，页面整理公开资料中的型号、用途和初步选型要点，适合科研检测、材料表征、工艺验证或设备采购沟通。

PHI Genesis 是全自动多技术扫描 XPS/HAXPES 微探针。

PHI nanoTOF 3 面向实验室样品处理与材料分析场景，页面整理官方产品资料中的用途、特点和关键参数，便于型号初筛与采购沟通。

PHI 710 是用于表面分析的扫描俄歇纳米探针仪器。

Oxford Instruments PlasmaPro 100 Estrelas DRIE 深反应离子刻蚀系统。PlasmaPro 100 Estrelas deep reactive ion etching (DRIE) system provides the ability to run Bosch™ and Cryo processes in the same chamber. Suitable for MEMS, Advanced Packaging and Nanotechnology markets.

Oxford Instruments PlasmaPro 100 RIE 反应离子刻蚀系统。PlasmaPro 100 Reactive Ion Etch System delivers anisotropic dry etching for an extensive range of processes.

Oxford Instruments PlasmaPro 100 Nano CVD CVD 沉积系统。The PlasmaPro 100 Nano system is a Chemical Vapour Deposition (CVD) tool for the growth of 1D & 2D nanomaterials and heterostructures. The system offers the flexibility of this technique for deposition down to atomic layers for processes such as graphene & diamond.