NEXUS IBE 离子束刻蚀 系统

产品信息

在多个能量和过程角度上具有无与伦比的均匀性

Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE™ Ion Beam Etching System. The IBE System offers unsurpassed uniformity over a wide range of energy and process angles, making it ideal for etch depth control of next-generation ABS step and cavity processing.

卓越的均匀性和改进的蚀刻深度控制

Highest throughput and reduced footprint for lowest cost of ownership

在世界一流的 NEXUS 硬件和软件平台上轻松与常见技术集成

NEXUS 离子源提高蚀刻均匀性和工艺重复性

也可与 RF350 源一起使用，用于经过过程合格使用 RF350 源的操作

平台可以经济高效地现场升级至 NEXUS 离子源

Veeco Receives Order for New Predictive Analytics Platform Featuring Rudolph Technologies Software That Lowers Customer Maintenance Costs and Improves Equipment Uptime

Veeco 离子束蚀刻技术实现了 100,000 分钟网格运行无故障的里程碑

财务信息

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