产品信息

P9000集群系统

The C&D P9000 Photoresist Coater & Developer Cluster System is designed to process 50mm to 300mm wafers. The P9000 can be equipped with a wide array of different modules, including multiple photoresist coaters or developers, vapor prime modules, hot plates, and chill plates. Specialized process modules are also available, including the use of optical centering and edge bead removal. C&D’s P9000 Cluster System is designed for flexibility and high throughput within a small footprint. The P9000 can be configured as a coater, developer, vapor prime, bake, chill or any variation, and can process a wide range of photoresist spin coating and photosensitive polymer applications.

C&D 专注于定制光刻胶涂布机，可满足特定客户的要求，以提高效率并降低成本。这意味着我们可以减少集群系统的占地面积，以适应晶圆厂内最关键的尺寸。另一方面，可以使用扩展槽来定制工具，以便将来实施附加模块或由于需求增加或项目开发变化而增加基板尺寸。

建发正在创造许多新的创新，它们都是建发 P9000 集群系统功能中突出的功能。特殊模块，例如超声波喷涂、C&D 革命性的 Synchrospin 涂层系统，以及传统模块的许多光学变体，例如光学边缘珠去除 (OEBR) 和光学定心。