SENTECH Depolab 200 PECVD 沉积系统。SENTECH Depolab 200 PECVD Open Lid System 是 a basic model 配备 the functions needed 用于 等离子增强化学气相沉积

SENTECH AL Real Time Monitor 椭偏仪。AL Real Time Monitor 用于 fast, precise process monnitoring and development 配备 ultra-high resolution of single ALD and ALE cycles.

SENTECH SI PEALD PEALD 原子层沉积系统。Si PEALD 原子层沉积 (ALD) 配备 the SI PEALD system 用于 precise, conformal, uniform and repeatable results

SENTECH SILAYO PEALD 原子层沉积系统。SENTECH SILAYO PEALD 是 a system specially designed 用于 use 配备 optical coatings on large substrates.

SENTECH SIPARS PECVD 沉积系统。SIPAR, the PECVD deposition system combining 等离子增强化学气相沉积 and 原子层沉积 in one Reactor.

SENTECH SI 原子层刻蚀系统。Atomic layer etching system 配备 stable plasma at low operating pressure and low ICP power 用于 低损伤 etching 配备 precise RF control.

SENTECH SI ICP-RIE 刻蚀系统。SI 500 ICP-RIE System 是 a 灵活且模块化 plasma etch system 配备 an ICP plasma source 用于 低损伤 etching and nanostructuring.

SENTECH SI PECVD 沉积系统。SI 500 D ICPECVD System 用于 低损伤, low-temperature inductively coupled 等离子增强化学气相沉积

SENTECH RM 1000 QC 反射膜厚测量系统。RM 1000 QC, an automated 光谱反射测量系统 用于 厚度 测量 transparent and semi-transparent films on patterned wafers.

SENTECH Plasma cluster configuration 等离子工艺集群系统。Fully integrated cluster configurations 用于 low damage ICP-RIE, ICPECVD, and PEALD able to fulfil the needs of production and R&D

SENTECH SENDURO accuva10 薄膜质量控制系统。SENDURO accuva10 fully-automated thin film Quality Control 测量 film 厚度, 折射率, and 消光系数

SENTECH SENTECH SENol 仪器系统。SENTECH SENsol precision QC 用于 Large Glass and Foil Substrates ensuring film 厚度 uniformity, quality and flatness.

PHI ADEPT 2 面向半导体工艺验证、产线补线与设备流通场景，页面整理公开资料中的型号、用途和初步选型要点，适合科研检测、材料表征、工艺验证或设备采购沟通。

PHI Genesis 是全自动多技术扫描 XPS/HAXPES 微探针。

PHI nanoTOF 3 面向实验室样品处理与材料分析场景，页面整理官方产品资料中的用途、特点和关键参数，便于型号初筛与采购沟通。

PHI 710 是用于表面分析的扫描俄歇纳米探针仪器。

Oxford Instruments PlasmaPro 100 Estrelas DRIE 深反应离子刻蚀系统。PlasmaPro 100 Estrelas deep reactive ion etching (DRIE) system provides the ability to run Bosch™ and Cryo processes in the same chamber. Suitable for MEMS, Advanced Packaging and Nanotechnology markets.

Oxford Instruments PlasmaPro 100 RIE 反应离子刻蚀系统。PlasmaPro 100 Reactive Ion Etch System delivers anisotropic dry etching for an extensive range of processes.

Oxford Instruments PlasmaPro 100 Nano CVD CVD 沉积系统。The PlasmaPro 100 Nano system is a Chemical Vapour Deposition (CVD) tool for the growth of 1D & 2D nanomaterials and heterostructures. The system offers the flexibility of this technique for deposition down to atomic layers for processes such as graphene & diamond.