Oxford Instruments PlasmaPro 100 RIE 反应离子刻蚀系统。PlasmaPro 100 Reactive Ion Etch System delivers anisotropic dry etching for an extensive range of processes.
Oxford Instruments PlasmaPro 100 ALE 原子层刻蚀系统。The PlasmaPro 100 ALE delivers precise etching for next-generation devices, offering low damage, smooth surfaces for a wide range of applications.
Oxford Instruments FlexAL ALD 原子层沉积系统。FlexAL atomic layer deposition (ALD) system offers a broad range of high-quality plasma-enhanced ALD and thermal ALD processes with maximum flexibility.
Oxford Instruments PlasmaPro ASP 原子层沉积系统。PlasmaPro ASP Shared platform with Atomfab to incorporate remote plasma source to enable low damage plasma ALD with fast cycle times
