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PlasmaPro 80 PECVD
Oxford Instruments PlasmaPro 80 PECVD PECVD 沉积系统。The PlasmaPro 80 PECVD system is a compact system with open-load design and excellent etch control and rate determination for wafers up to 200mm. PlasmaPro 80 PECD is suitable for silicon nitride & silicon dioxide for photonics, passivation and much more.
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Oxford Instruments PlasmaPro 80 PECVD PECVD 沉积系统。The PlasmaPro 80 PECVD system is a compact system with open-load design and excellent etch control and rate determination for wafers up to 200mm. PlasmaPro 80 PECD is suitable for silicon nitride & silicon dioxide for photonics, passivation and much more.
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