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PlasmaPro 100 Atomic Layer Etch with Etchpoint
Oxford Instruments PlasmaPro 100 Atomic Layer Etch with Etchpoint 等离子工艺系统。Oxford Instruments Plasma Technology has developed a unique solution to enable reliable etching and improved manufacturability of p-GaN HEMTs and recessed gate MISHEMTs for power electronics applications.
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Oxford Instruments PlasmaPro 100 Atomic Layer Etch with Etchpoint 等离子工艺系统。Oxford Instruments Plasma Technology has developed a unique solution to enable reliable etching and improved manufacturability of p-GaN HEMTs and recessed gate MISHEMTs for power electronics applications.
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